Macroporous Silicon Electrochemical Etching for Gas Diffusion Layers Applications: Effect of Processing Temperature

Keyphrases

• Processing Temperature 100%
• Electrochemical Etching 100%
• Application Effect 100%
• Gas Diffusion Layer 100%
• Macroporous Silicon 100%
• Porous Silicon 100%
• Processing Effects 100%
• Hydrofluoric Acid 66%
• Large-scale Fabrication 33%
• Electrochemical Anodization 33%
• Local Formation 33%
• Micro Fuel Cell 33%
• Silicon Substrate 33%
• Wet Etching 33%
• Doped Polycrystalline Silicon 33%
• Current Collector 33%
• Etching Rate 33%
• Macropore Morphology 33%
• Silicon Wafer 33%
• Thin Gold Layers 33%
• Thermal Oxide 33%
• Phosphorus Doping 33%
• Hydrofluoric Acid Solution 33%
• Deep Reactive Ion Etching 33%
• Layer Deposition 33%
• 2D Silicon 33%
• Process Quality 33%
• MEMS Technology 33%
• Electrochemical System 33%
• Oxide Layer 33%
• Poly-Si 33%
• 3D Silicon 33%
• Temperature Process 33%
• In Situ 33%
• Low-cost Method 33%
• Etching Process 33%
• Porous Substrate 33%
• Temperature Effect 33%

Engineering

• Electrochemical Etching 100%
• Gas Diffusion Layer 100%
• Porous Silicon 100%
• Polysilicon 66%
• Anodization 66%
• Current Collector 33%
• Silicon Wafer 33%
• Porous Substrate 33%
• Micro Fuel Cell 33%
• Deep Reactive Ion Etching 33%
• Etch Rate 33%
• Macropore 33%
• Oxide Layer 33%
• Silicon Substrate 33%
• Microelectromechanical System 33%
• Hydrofluoric Acid Solution 33%

Material Science

• Electrochemical Etching 100%
• Silicon 100%
• Porous Silicon 75%
• Anodizing 50%
• Microelectromechanical System 25%
• Silicon Wafer 25%
• Wet Etching 25%
• Reactive Ion Etching 25%
• Oxide Compound 25%